Halocarbon 14 - SIAD Società Italiana Acetilene e Derivati
Halocarbon 14 header
Halocarbon 14, CF4, (tetrafluoromethane) is a colourless, nonflammable, high-pressure gas.
With added oxygen, CF4 (usually >80% mixture concentration) is used for plasma etching of polysilicon, silicon dioxide, silicon nitride, refractory metals and metal silicides. Etching and stripping of photoresists and other polymers are also major uses of CF4 (usually <20%) and oxygen mixtures.
Metals: Brass; Stainless Steel; Carbon Steel; Aluminum; Copper; Monel.
Plastics: Kel-F; PTFE, FEP, and PFA Fluoropolymers resins; Tefzel; PVDF.
Elastomers: Viton; Buna-N; Neoprene; Polyurethane.
Molecular Weight: 88
Specific Gravity (Air=1): 3.04
CAS Registry No.: 75-73-0