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Halocarbon 23

Halocarbon 23, CHF3, (trifluoromethane) is a colourless, nonflammable, liquefied, high-pressure gas shipped at its vapor pressure of 635 psig (4,380 kPa) at 70°F (21°C).

In the semiconductor industry, Halocarbon 23 is used for:

  • plasma etching, especially of SiO2 and Si3N4 where good selectivity versus underlying polysilicon can be achieved. With added oxygen, polymer formation can be controlled; additional hydrogen-rich gases improve the SiO2 -to-Si selectivity.

Materials Compatibility
Metals: Brass; Stainless Steel; Carbon Steel; Copper; Monel.
Plastics: PTFE, FEP, and PFA Fluoropolymers resins; PVDF.
Elastomers: Viton; Buna-N; Neoprene.

Technical Properties
Molecular Weight: 70.01
Specific Gravity (Air=1): 2.43
Odour: Slightly Ether-Like
CAS Registry No.: 75-46-7