Halocarbon 23 - SIAD Società Italiana Acetilene e Derivati
Halocarbon 23 header
Halocarbon 23, CHF3, (trifluoromethane) is a colourless, nonflammable, liquefied, high-pressure gas shipped at its vapor pressure of 635 psig (4,380 kPa) at 70°F (21°C).
In the semiconductor industry, Halocarbon 23 is used for:
- plasma etching, especially of SiO2 and Si3N4 where good selectivity versus underlying polysilicon can be achieved. With added oxygen, polymer formation can be controlled; additional hydrogen-rich gases improve the SiO2 -to-Si selectivity.
Metals: Brass; Stainless Steel; Carbon Steel; Copper; Monel.
Plastics: PTFE, FEP, and PFA Fluoropolymers resins; PVDF.
Elastomers: Viton; Buna-N; Neoprene.
Molecular Weight: 70.01
Specific Gravity (Air=1): 2.43
Odour: Slightly Ether-Like
CAS Registry No.: 75-46-7