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Dichlorosilane, SiH2Cl2, is a colourless, toxic, flammable, corrosive liquid shipped at its vapour pressure of 9.1 psig (63 kPa) at 70°F (21°C).

In the semiconductor industry, dichlorosilane is used for:

  • growth of epitaxial and polycrystalline silicon
  • chemical vapour deposition of silicon dioxide and nitride, and tungsten silicide.

Higher purities of dichlorosilane can be especially useful for high-purity depositions such as epi for CMOS, which requires very low carbon and metallic impurities.

Materials Compatibility
Metals: Brass; Stainless Steel; Carbon Steel; Copper; Monel.
Plastics: Kel-F; PTFE, FEP, and PFA Fluoropolymers resins; Tefzel; Kalrez; PVDF.
Elastomers: Viton.

Technical Properties
Molecular Weight: 101.01
Specific Gravity (Air=1): 3.52
Odour: Pungent, Suffocating
CAS Registry No.: 4109-96-0